Become part of a community of book lovers from all over the world and get access to a whole bunch of benefits.
Create an account for free
Contact
How to shop
Help
Delivery
DPD courier 4.99 €
GLS courier 11.49 €
Shopping guide
My account
▸
Empty :-(
0
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Language
English
English
Book
Hardback
This book describes the application of machine learning modelling approaches in atomic layer deposit...
Full description
Libristo code: 43909170
?
606 b
606 b
250.92
€
In stock at our supplier
Shipping in 9-15 days
30-day return policy
Customers also purchased
/
Paperback
32.80
€
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Actress
&
Polyglot
EWA KASP
for
Play video
Libristo has the largest selection of foreign-language books. That’s why I buy my books there.
About the book
Full name
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Author
Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)
Language
English
English
Binding
Book - Hardback
Date of issue
2023
Number of pages
496
EAN
9781032386706
Libristo code
43909170
Publishers
Taylor & Francis Ltd
Weight
662
Dimensions
156 x 234
Give this book today
It's easy
1 Add to cart and choose Deliver as present at the checkout 2 We'll send you a voucher 3 The book will arrive at the recipient's addressYou might also be interested in
/
Paperback
17.20
€
/
Paperback
20.75
€
Book advisor Libroamiko
By using this chat, you are communicating with generative artificial intelligence. By using it, you also agree to the processing of personal data.
Hi! I'm Libroamiko, your book advisor.
How can I help you?
Hi, I'm Libroamiko, can I help?