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Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Language
English
English
Book
Paperback
This book describes the application of machine learning modelling approaches in atomic layer deposit...
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Libristo code: 48234675
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
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About the book
Full name
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Author
Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)
Language
English
English
Binding
Book - Paperback
Date of issue
2025
Number of pages
354
EAN
9781032386737
Libristo code
48234675
Publishers
Taylor & Francis Ltd
Weight
700
Dimensions
156 x 234
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