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Atomic Layer Deposition
Language
English
English
E-book
Adobe ePub DRM
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf...
Full description
Libristo code: 39915569
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566 b
566 b
233.96
€
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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About the book
Full name
Atomic Layer Deposition
Author
Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
Language
English
English
Binding
E-book - Adobe ePub DRM
Date of issue
2013
EAN
9781118747384
Libristo code
39915569
Publishers
Wiley-Scrivener
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